Wafer Inspection Bright/Dark Field Metallographic Microscope

● Head: 5-35° tilt angle adjustable, Erect image, interpupillary adjustable distance: 50-76mm, splitting ratio R:T=100:0 or 0:100 (support 22/ 23/ 16mm field of view)
● Eyepieces: PL 10X/22mm
● Objective: Infinity LWD B&D plan achromatic metallurgical objectives
                    5X/ 0.15 WD=9.00mm
                    10X/ 0.30 WD=9.00mm
                    20X/ 0.45 WD=3.40mm
                    50X/0.55 WD=7.50mm
● Condensor: B&D reflect illumination, with Iris field diaphragm and aperture diaphragm, central adjustable, with filter slot and polarizing slot, with switch device sIth bright and dark field
● Nosepiece: Backward quintuple nosepiece, with DIC slot
● Focus: Coaxial coarse and fine adjustment, coarse adjustment 33mm, precision of fine adjustment: 0.001mm, with coarse adjustment stop and tightness adjustment
● Stage: 6" double layers mechanical stage 445x240mm, Reflected Light moving range 158x158mm, Transmitted Light moving range 100x100mm, with glass insert, right hand position X-Y moving hand wheel, with glass work plate
● Reflected Illumination: 12V100W Halogen lamp house, Pre-Centering, 12V100W Halogen lamp
● Polarizing kits: Polarizer (for reflection), 360° Rrotatable analyzer
● Camera Adapter Accessories: 0.35X camera adapter, C-type interface, adjustable